Chemical Vapor Deposition and Functionalization of Fluorocarbon-Organosilicon Copolymer Thin Films

نویسندگان

  • Shashi Krishna Murthy
  • Karen K. Gleason
  • Harry L. Tuller
چکیده

Neural prostheses are micron-scale integrated circuit devices that are under development for the treatment of brain and spinal cord injuries. A key challenge in the fabrication of these siliconbased devices is the protection of the electronic components from the ambient body environment. There is a need for a biopassivation coating on these devices that is chemically inert and electrically insulating with good adhesion to the underlying silicon substrate. Fluorocarbon-organosilicon copolymers are of interest for this application because they have the desirable attributes of both fluorocarbon and organosilicon polymers, such as low dielectric constant, thermal stability, and good adhesion to silicon. Chemical vapor deposition (CVD) is an attractive synthetic technique for this application because it is single-step, requires no solvent, and allows conformal coatings to be deposited on substrates with complex topographies and small dimensions. Fluorocarbon-organosilicon copolymers have been synthesized by hot-filament CVD, a thermal CVD technique. Control over deposition rate and chemical structure is achieved by precursor choice and variation of filament temperature. Chemical characterization by infrared (FTIR), x-ray photoelectron (XPS), and solid-state nuclear magnetic resonance (NMR) spectroscopies indicates that the copolymer films range from highly cross-linked films to flexible films comprised mostly of linear polymer chains. This variation in chemical composition influences physical properties such as thermal stability and flexibility. The possibility of creating bioactive surface coatings has been explored by using the techniques of CVD and solution chemistry in combination. Chains of poly(acrylamide) have been grafted onto fluorocarbon-organosilicon films as a first step towards the design of bioactive coatings that could potentially enhance the performance of medical implants. Thesis Supervisor: Karen K. Gleason Title: Professor of Chemical Engineering

برای دانلود رایگان متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Hot-Filament Chemical Vapor Deposition of Organosilicon Thin Films from Hexamethylcyclotrisiloxane and Octamethylcyclotetrasiloxane

A nonplasma technique, hot-filament chemical vapor deposition ~HFCVD!, is an alternative method for producing organosilicon films of novel structure. Films are deposited onto room-temperature substrates from the precursors hexamethylcyclotrisiloxane (D3) and octamethylcyclotetrasiloxane (D4) at high rates ~.1 mm/min!. Filament temperature can be used to control film structure, and the limited r...

متن کامل

Optimized Conditions for Catalytic Chemical Vapor Deposition of Vertically Aligned Carbon Nanotubes

Here, we have synthesized vertically aligned carbon nanotubes (VA-CNTs), using chemical vapor deposition (CVD) method. Cobalt and ethanol are used as the catalyst and the carbon source, respectively. The effects of ethanol flow rate, thickness of Co catalyst film, and growth time on the properties of the carbon nanotube growth are investigated. The results show that the flow rate of ethanol and...

متن کامل

Polymeric Fluorocarbon Films via Hot-Filament Chemical Vapor Deposition

Hot Filament Chemical Vapor Deposition (HFCVD) offers the ability to tailor the chemistry of films with polymeric structure. In particular, HFCVD allows for more control over precursor fragmentation pathways than conventional plasma-enhanced CVD (PECVD). HFCVD uses thermal activation in the gas phase to generate reactive species, and allows independent control of the substrate temperature to be...

متن کامل

Stable dropwise condensation for enhancing heat transfer via the initiated chemical vapor deposition (iCVD) of grafted polymer films.

Ultra-thin copolymer films are deposited by initiated chemical deposition (iCVD) to investigate their performance under the condensation of water vapor. By forming a grafted interface between the coating and the substrate, the films exhibit stable dropwise condensation even when subjected to 100 °C steam. The applicability of the iCVD to complex substrate geometries is demonstrated on a copper ...

متن کامل

Preparation of Cr-doped TiO2 thin film by sonochemical/CVD method and its visible light photocatalytic activity for degradation of paraoxon

In this work, nanostructured TiO2 and Cr-doped TiO2 thin films were deposited on glass substrate through sonochemical-chemical vapor deposition (CVD) method. The resulting thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible absorption spectroscopy, and photoluminescence spectroscopy techniques. The TiO2 thin film has nanocubic morphology and ...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2003